Stress relaxation of a patterned microstructure on a diaphragm

Journal of Materials Research

Volumn 17, Issue 7, 2002, Pages 1795-1802

  Zheng, D W ^a   Wang, X H ^a   Shyu, K ^a   Che, C ^a   Chang, C T ^a   Tu, K N ^a   Mal, A K ^a   Guo, Y F ^a  

^a Lightcross Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DIAPHRAGMS; INTERFEROMETERS; MICROSTRUCTURE; RESIDUAL STRESSES; STRESS CONCENTRATION; STRESS RELAXATION; SUBSTRATES; TENSILE STRESS;

TWYMAN-GREEN LASER INTERFEROMETERS;

THIN FILMS;

EID: 0036649795     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2002.0266     Document Type: Article

References (24)

1. A review of deposition, patterning, and stress of metal films used as absorber in masks for synchrotron X-ray lithography