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Volumn 563, Issue , 1999, Pages 243-248
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On the methodology of numerical etching
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Author keywords
[No Author keywords available]
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Indexed keywords
MICROSTRUCTURE;
NUMERICAL ANALYSIS;
RESIDUAL STRESSES;
STRESS CONCENTRATION;
THIN FILMS;
NUMERICAL ETCHING;
ELECTRIC CONTACTS;
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EID: 0033284604
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-563-243 Document Type: Article |
Times cited : (2)
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References (12)
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