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Volumn 287, Issue 1-2, 1996, Pages 214-219
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Micromachined silicon cantilever beams for thin-film stress measurement
a a b b b b b |
Author keywords
Auger electron spectroscopy; Etching; Silicon; Stress
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Indexed keywords
AUGER ELECTRON SPECTROSCOPY;
COMPOSITION EFFECTS;
ETCHING;
MICROMACHINING;
POTASSIUM COMPOUNDS;
RESIDUAL STRESSES;
STRESS ANALYSIS;
SURFACE ROUGHNESS;
THERMAL EFFECTS;
THIN FILMS;
ANISOTROPIC ETCHANT;
DOUBLE SIDE POLISHED SILICON WAFERS;
MICROMACHINED SILICON CANTILEVER BEAMS;
POTASSIUM HYDROXIDE;
THIN FILM STRESS MEASUREMENT;
SILICON WAFERS;
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EID: 0030259424
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(96)08754-8 Document Type: Article |
Times cited : (13)
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References (12)
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