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Volumn 287, Issue 1-2, 1996, Pages 214-219

Micromachined silicon cantilever beams for thin-film stress measurement

Author keywords

Auger electron spectroscopy; Etching; Silicon; Stress

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION EFFECTS; ETCHING; MICROMACHINING; POTASSIUM COMPOUNDS; RESIDUAL STRESSES; STRESS ANALYSIS; SURFACE ROUGHNESS; THERMAL EFFECTS; THIN FILMS;

EID: 0030259424     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08754-8     Document Type: Article
Times cited : (13)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.