Etching of boron nitride in radio frequency plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2816-2819

  Schaffnit, C ^a   Thomas, L ^a,b   Rossi, F ^a  

^a JOINT RESEARCH CENTRE   (Italy)

^b UNIVERSITÉ DE PERPIGNAN   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031515025     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580830     Document Type: Article

References (21)

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