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Applied Physics A: Materials Science and Processing

Volumn 75, Issue 1, 2002, Pages 155-166

Substrate-step-induced effects on the growth of CaF2 on Si(111)

(1) Wollschlager J a

a LEIBNIZ UNIVERSITY HANNOVER (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ENERGY GAP; FILM GROWTH; INTERFACES (MATERIALS); LATTICE CONSTANTS; NUCLEATION; RESONANT TUNNELING; SCANNING TUNNELING MICROSCOPY; SILICON; SUBSTRATES;

CALCIUM DIFLUORIDE; CALCIUM FLUORIDE;

CALCIUM COMPOUNDS;

EID: 0036642922 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390101064 Document Type: Article

Times cited : (17)

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