Film and interface morphology of CaF2 grown on Si(111) at low temperature

Journal of Applied Physics

Volumn 79, Issue 9, 1996, Pages 7373-7375

  Wollschläger, Joachim ^a   Meier, Andreas ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006201306     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361525     Document Type: Article

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