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Journal of the Electrochemical Society

Volumn 149, Issue 7, 2002, Pages

The variation of ohmic contacts and surface characteristics on p-GaN induced by reactive ion etching

(3) Chang, Kow Ming a Cheng, Chao Chen a Chu, Jiunn Yi a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON CYCLOTRON RESONANCE; OHMIC CONTACTS; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; RAPID THERMAL ANNEALING; REACTIVE ION ETCHING; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA TREATMENT;

GALLIUM NITRIDE;

EID: 0036641490 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1479161 Document Type: Article

Times cited : (24)

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