Application of a bilayer silylated resist process in volume production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 860-868

  Franzen, Robert ^a   Grassmann, Andreas ^a   Kirschinger, Markus ^a   Schedel, Thorsten ^a   Wiedenhofer, Harald ^a   Witte, Markus ^a  

^a SIEMENS AG   (Germany)

Author keywords

ARC; Bilayer; CARL; Silylation; Volume production

Indexed keywords

ARC; BILAYER; CARL; SILYLATION; VOLUME PRODUCTION;

CAVITY RESONATORS; DEFECT DENSITY;

SILANES;

EID: 0013359512     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312442     Document Type: Conference Paper

References (14)

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