Negative tone resist for Phase-Shifting Mask technology: A progress report

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (I), Issue , 2000, Pages 91-101

  Richter, E ^a   Elian, K ^a   Hien, S ^a   Kuehn, E ^a   Sebald, M ^a   Shirai, M ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ADDITION REACTIONS; DEGASSING; INTERDIFFUSION (SOLIDS); MASKS; PHASE SHIFT;

PHASE-SHIFTING MASKS; PHOTOACID GENERATORS (PAG); PHOTOBASE GENERATORS (PBG); THERMOACID GENERATORS (TAG);

PHOTORESISTS;

EID: 0033685590     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388361     Document Type: Conference Paper

References (23)