Effect of lens aberration on hole pattern fabrication using halftone phase-shifting masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 298-307

  Otaka, Akihiro ^a   Kawai, Yoshio ^a   Sakakibara, Yutaka ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; FABRICATION; LENSES; PHASE SHIFT;

HALFTONE PHASE-SHIFTING MASKS;

MASKS;

EID: 0031387816     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277262     Document Type: Conference Paper

References (8)