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Volumn 149, Issue 4, 2002, Pages
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Effect of oxygen in deposited ultrathin silicon nitride film on electrical properties
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMS;
CAPACITANCE MEASUREMENT;
CHEMICAL BONDS;
INTERFACES (MATERIALS);
NITROGEN;
OXYGEN;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICA;
SILICON;
SILICON NITRIDE;
VOLTAGE MEASUREMENT;
X RAY PHOTOELECTRON SPECTROSCOPY;
SILICA FILM;
SILICON NITRIDE FILM;
STACKED STRUCTURE;
ULTRATHIN FILMS;
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EID: 0036530970
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1461380 Document Type: Article |
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Times cited : (4)
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References (16)
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