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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 2, 2002, Pages 622-630

Atomistic simulations of deep submicron interconnect metallization

(4) Yang, Y G a Zhou, X W a Johnson, R A a Wadley, H N G a

a University of Virginia (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DIFFUSION; KINETIC ENERGY; MICROELECTRONICS; MOLECULAR DYNAMICS; MONTE CARLO METHODS; OPTICAL INTERCONNECTS; PHYSICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; REFRACTORY MATERIALS; RELAXATION PROCESSES; SPUTTER DEPOSITION;

MICROELECTRONIC INTERCONNECTS;

METALLIZING;

EID: 0036504841 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1458952 Document Type: Article

Times cited : (13)

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