Thin, high atomic weight refractory film deposition for diffusion barrier, adhesion layer, and seed layer applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 1819-1827

  Rossnagel, S M ^a   Nichols, C ^a,b   Hamaguchi, S ^a   Ruzic, D ^a,c   Turkot, R ^a,c  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b The College of William and Mary   (United States)

^c University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0242366928     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588562     Document Type: Article

References (19)

1. J.A. Thornton, J. Vac. Sci. Technol. 11, 666 (1974).
2. D. Pramanik and V. Jain, Solid State Technol. 73-38 (1973).
3. M. Wittmner, J. Vac. Sci. Technol. A 3, 1797 (1985).
4. G. Dixit, C. Wei, and F. Liou, Appl. Phys. Lett. 62, 471 (1985).
5. J.-C. Chiou and M.-C. Chen, Proceedings of the VLSI Multilevel Interconnect Conference (VMIC), Santa Clara, CA, 1995 (unpublished), p. 207.
6. S.M. Rossnagel, D. Mikalsen, H. Kinoshita, and J. Cuomo, J. Vac. Sci. Technol. A 9, 261 (1991).
7. R. Joshi and S. Brodsky, Proceedings of the VLSI Multilevel Interconnect Conference (VMIC), Santa Clara, CA, 1992 (unpublished), p. 253.
8. K.C. Wang, E.J.H. Chiang, A.L. Helms, Jr., and R. Wu, in Ref. 5, p. 204.
9. S.M. Rossnagel and J. Hopwood, Appl. Phys. Lett. 63, 3285 (1993).
10. S.M. Rossnagel and J. Hopwood, J. Vac. Sci. Technol. B 12, 449 (1994).
11. S. Hamaguchi and S. Rossnagel, J. Vac. Sci. Technol. B 13, 183 (1995).
12. P.F. Cheng, S.M. Rossnagel, and D.N, Ruzic, J. Vac. Sci. Technol. B 13, 203 (1995).
13. S.M. Rossnagel, Thin Solid Films 263, 1 (1995).
14. D. Edelstein (private communication).
15. A. Leybovich, T. Kuniya, P.C. Smith, M.B. Hendricks, and D.N. Ruzic, J. Vac. Sci. Technol. A 12, 1618 (1994).
16. G. K. Wehner, Phys. Rev. 114, 1270 (1959).
17. D. Ruzic, in Handbook of Plasma Processing Technology, edited by S.M. Rossnagel, J.J. Cuomo, and W.D. Westwood (Noyes, Park Ridge, NJ, 1990), Chap. 3.
18. D.N. Ruzic, Nucl. Instrum. Methods B 47, 118 (1990).
19. J.J. Cuomo and S.M. Rossnagel, J. Vac. Sci. Technol. A 4, 393 (1986).