Xenon liquid-jet laser-plasma source for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 729-732

  Hansson, Bjorn A M ^a   Berglund, Magnus ^a   Hemberg, Oscar ^a   Hertz, Hans M ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA JETS; PLASMA SOURCES; ULTRAVIOLET RADIATION; XENON;

EXTREME ULTRAVIOLET PROJECTION LITHOGRAPHY; LASER PRODUCED PLASMAS;

PHOTOLITHOGRAPHY;

EID: 0033716210     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (21)