Plasmon printing - A new approach to near-field lithography

Materials Research Society Symposium - Proceedings

Volumn 705, Issue , 2002, Pages 101-106

  Kik, Pieter G ^a   Maier, Stefan A ^a   Atwater, Harry A ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ELECTRIC FIELDS; FINITE DIFFERENCE METHOD; NANOSTRUCTURED MATERIALS; PHOTORESISTS; SILVER; SURFACE PLASMON RESONANCE; TIME DOMAIN ANALYSIS;

BROAD BEAM ILLUMINATION; NANOSCALE METALLIC STRUCTURE; NEAR-FIELD LITHOGRAPHY; PLASMON PRINTING; SILVER NANOPARTICLE;

NANOTECHNOLOGY;

EID: 0036354380     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)