Structure changes in a-C:H films in inductive CH4/Ar plasma deposition

Thin Solid Films

Volumn 333, Issue 1-2, 1998, Pages 103-107

  Teii, Kungen ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Amorphous hydrogenated carbon; Ion bombardment; Plasma diagnostics; Stress

Indexed keywords

AMORPHOUS FILMS; ARGON; CARBON; COMPRESSIVE STRESS; ION BOMBARDMENT; METHANE; PLASMA SPRAYING;

CARBON FILMS; INDUCTIVE PLASMAS;

THIN FILMS;

EID: 0032205002     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00845-1     Document Type: Article

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