High rate deposition of diamond-like carbon films by magnetically enhanced plasma CVD

Thin Solid Films

Volumn 355, Issue , 1999, Pages 146-150

  Sun, Z ^a   Shi, X ^a   Liu, E ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; ELECTRIC POTENTIAL; IONIZATION; MAGNETIC FIELD EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

MAGNETICALLY ENHANCED PLASMA CHEMICAL VAPOR DEPOSITION (MEPCVD);

AMORPHOUS FILMS;

EID: 0033354172     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00484-8     Document Type: Article

References (11)

1. Lieberman M.A., Lichtenberg A.J. Principles of plasma discharges and materials processing. 1994;Wiley, New York.
2. Ohnishi M., Nishiwaki H., Uchihashi K., et al. Jpn. J. Appl. Phys. 27:1988;40.
3. Dworschak W., Jung K., Ehrhardt H. Diamond Rel. Mater. 3:1994;337.
4. Silva S.R.P., Clay K.J., Speakman S.P., Amaratunga G.A.J. Diamond Rel. Mater. 4:1995;977.
5. Schwan J., Ulrich S., Jung K., Ehrhardt H., Samlenski R., Brenn R. Diamond Rel. Mater. 4:1995;304.
6. Vossen J.L. Kern W. Thin Film Processes II. 1991;43 Academic Press, New York.
7. Zhang W., Catherine Y. Surf. Coat. Technol. 47:1991;69.
8. Tamor M.A., Haira J.A., Wu C.H., Hass K.C. Appl. Phys. Lett. 54:1989;123.
9. Tamor M.A., Vasell W.C., Karduner K.R. Appl. Phys. Lett. 58:1991;592.
10. Koildl P., Wild C., Dischler B., Wagner J., Ramsteiner M. Mater. Sci. Forum. 52:1990;41.
11. Lifshitz Y., Lempert G.D., Rotter S., et al. Diamond Rel. Mater. 3:1994;542.