Fabrication of a micromachined optical modulator using the CMOS process

Journal of Micromechanics and Microengineering

Volumn 11, Issue 5, 2001, Pages 612-615

  Dai, Ching Liang ^a   Chen, Hung Lin ^b   Chang, Pei Zen ^b  

^a ORIENTAL INSTITUTE OF TECHNOLOGY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; DIFFRACTION GRATINGS; ETCHING; LIGHT MODULATION; LIGHT MODULATORS; LIGHT REFLECTION; MICROACTUATORS; MICROMACHINING; OPTICAL DESIGN; OPTICAL SWITCHES;

ELECTROSTATIC ACTUATION; MASKLESS ETCHING; OPTICAL MODULATOR DESIGN;

MICROELECTRONIC PROCESSING;

EID: 0035443264     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/11/5/326     Document Type: Article

References (4)

1. Development and characterization of micromechanical gratings for optical modulation
2. Surface microfabrication of deformable grating light valves for high resolution displays
3. CMOS foundry-based micromachining
4. Laminated high-aspect-ratio microstructures in a conventional CMOS process