Fabrication process for integrating polysilicon microstructures with post-processed CMOS circuits

Journal of Micromechanics and Microengineering

Volumn 10, Issue 3, 2000, Pages 380-386

  Gianchandani, Y B ^c   Kim, H ^a   Shinn, M ^a   Ha, B ^a   Lee, B ^a   Najafi, K ^b   Song, C ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b The Department of Civil and Environmental Engineering   (United States)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; SEMICONDUCTING SILICON;

POLYSILICON;

MICROELECTROMECHANICAL DEVICES;

EID: 0034275758     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/10/3/312     Document Type: Article

References (10)

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