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Semiconductor Science and Technology

Volumn 17, Issue 1, 2002, Pages 47-54

A comparison of laser- and furnace-annealed polysilicon structure

(7) Parr, Andrea A a Gill, Kelly a Gardiner, Derek J a Hoyland, James D b Sands, David b Brunson, Kevin c Carline, Roger T c

a NORTHUMBRIA UNIVERSITY (United Kingdom)

b UNIVERSITY OF HULL (United Kingdom)

c DEFENCE SCIENCE AND TECHNOLOGY LABORATORY (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; ION IMPLANTATION; LASER BEAM EFFECTS; LIGHT REFLECTION; PHOSPHORUS; SINGLE CRYSTALS;

LASER ANNEALING;

POLYSILICON;

EID: 0036141487 PISSN: 02681242 EISSN: None Source Type: Journal
DOI: 10.1088/0268-1242/17/1/308 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.