Micro-Raman characterization of crystallinity of laser-recrystallized silicon films on SiO2 insulators

Journal of Applied Physics

Volumn 85, Issue 9, 1999, Pages 6758-6762

  Mizoguchi, K ^a   Nakashima, S ^a   Sugiura, Y ^a   Harima, H ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001751579     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370190     Document Type: Article

References (26)

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