Effect of multiple scans and granular defects on excimer laser annealed polysilicon TFTs

Solid-State Electronics

Volumn 43, Issue 2, 1999, Pages 305-313

  Marmorstein, Aaron M ^a   Voutsas, Apostolos T ^b   Solanki, Raj ^a  

^a OREGON HEALTH AND SCIENCE UNIVERSITY   (United States)

^b Sharp Microelectronics Technology Inc Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EXCIMER LASERS; GRAIN BOUNDARIES; INTERFACES (MATERIALS); LEAKAGE CURRENTS; POLYCRYSTALLINE MATERIALS; THRESHOLD VOLTAGE;

LASER SCAN PROCESSES; POLYSILICON;

THIN FILM TRANSISTORS;

EID: 0033079499     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(98)00249-4     Document Type: Article

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