SCOPUS 정보 검색 플랫폼

Volumn 82-84, Issue , 2002, Pages 315-320

Hydrogen redistribution and void formation in hydrogen plasma treated Czochralski silicon

(5) Ulyashin, A a Job, R a Fahrner, W R a Grambole, D a Herrmann, F a

Author keywords

ERDA; Hydrogen in silicon; Raman; SEM; SRP; Voids

Indexed keywords

ANNEALING; DIFFUSION; HYDROGEN; HYDROGENATION; LOW TEMPERATURE PROPERTIES; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT;

ELASTIC RECOIL DETECTION ANALYSIS; HYDROGEN ENHANCED THERMAL DONOR FORMATION; HYDROGEN REDISTRIBUTION; PLASMA HYDROGENATION; SPREADING RESISTANCE PROBE ANALYSIS; VOIDS;

SEMICONDUCTING SILICON;

EID: 0036131558 PISSN: 10120394 EISSN: None Source Type: Book Series
DOI: None Document Type: Conference Paper

Times cited : (27)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.