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Volumn 20, Issue 1, 2002, Pages 47-52

Inductively coupled plasma etching of InP using Ch4/H2 and Ch4/H2/N2

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFUSION; EROSION; INDUCTIVELY COUPLED PLASMA; METHANE; MIXTURES; MORPHOLOGY; PLASMA ETCHING; SUBSTRATES; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0036120822     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1428277     Document Type: Conference Paper
Times cited : (9)

References (45)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.