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Volumn 16, Issue 4, 1998, Pages 1823-1832

X-ray photoelectron spectroscopy damage characterization of reactively ion etched InP in CH4-H2 plasmas

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[No Author keywords available]

Indexed keywords


EID: 0001543246     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (14)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.