Pattern transfer processes for 157-nm lithography

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 221-232

  Miyoshi, Seiro ^a   Furukawa, Takamitsu ^a   Watanabe, Hiroyuki ^a   Irie, Shigeo ^a   Itani, Toshiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

157 nm lithography; Bi layer process; Fluoropolymer; Gate fabrication; Hard mask; Pattern transfer

Indexed keywords

ANTIREFLECTION COATINGS; FLUORINE; FLUORINE CONTAINING POLYMERS; MASKS; REACTIVE ION ETCHING; SILICON COMPOUNDS;

HARD MASKS (HM); PATTERN TRANSFER PROCESSES;

LITHOGRAPHY;

EID: 0036030771     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474221     Document Type: Article

References (20)

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