Investigation of a fluorinated ESCAP based resist for 157 nm lithography

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 522-532

  Cho, Sungseo ^a   Klauck Jacobs, Axel ^b   Yamada, Shintaro ^a   Xu, Cheng Bai ^a   Leonard, JoAnne ^a   Zampini, Anthony ^a  

^a SHIPLEY COMPANY   (United States)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

157 nm lithography; 4 Hydroxy tetrafluorostyrene; Fluorine containing polymers; Photoresists; VUV absorbance

Indexed keywords

ETCHING; FLUORINE CONTAINING POLYMERS; FUNCTIONAL POLYMERS; MONOMERS; RESINS; SOLUBILITY; THERMODYNAMIC STABILITY; THIN FILMS;

ETCH RESISTANCE;

PHOTORESISTS;

EID: 0036029774     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474251     Document Type: Article

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