157 nm resist materials: Progress report

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3396-3401

  Brodsky, Colin ^a   Byers, Jeff ^a   Conley, Will ^a   Hung, Raymond ^a   Yamada, Shintaro ^a   Patterson, Kyle ^a   Somervell, Mark ^a   Trinque, Brian ^a   Tran, H V ^a   Cho, Sungseo ^a   Chiba, Takashi ^a   Lin, Shang Ho ^a   Jamieson, Andrew ^a   Johnson, Heather ^a   Vander Heyden, Tony ^a   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ETCHING; LIGHT ABSORPTION; MONOMERS; OXYGEN; POLYETHYLENES; SEMICONDUCTOR DEVICE MANUFACTURE; TRANSPARENCY; WATER;

CHEMICALLY AMPLIFIED RESISTS;

PHOTORESISTS;

EID: 0034317848     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321762     Document Type: Article

References (19)

1. J. Canning, Next Generation Lithography Workshop (Sematech International, Austin, TX, 1999).
2. R. H. Partridge, J. Chem. Phys. 45, 1685 (1966).
3. R. R. Kunz, T. M. Bloomstein, D. E. Hardy, R. B. Goodman, D. K. Downs, and J. E. Curtin, Proc. SPIE 3678, 13 (1999).
4. D. D. Perrin and W. L. F. Armarego, Purification of Laboratory Chemicals (Butterworth, Oxford, 1988).
5. K. J. Przybilla, H. Roschert, and G. Pawlowski, Proc. SPIE 1672, 500 (1992).
6. J. R. Grandler and W. P. Jencks, J. Am. Chem. Soc. 104, 1982 (1937).
7. H. Ito, N. Seehof, R. Sato, T. Nakayama, and M. Ueda, ACS Symp. Ser. 706, 210 (1998).
8. S. A. MacDonald, C. G. Willson, and J. M. J. Fréchet, Acc. Chem. Res. 27, 151 (1994).
9. J. W. Raymonda and W. T. Simpson, J. Chem. Phys. 47, 430 (1967).
10. N. N. Matsuzawa, S. Mori, E. Yano, S. Okazaki, A. Ishitani, and D. A. Dixon, Proc. SPIE 3999 (2000).
11. H. Ito, D. C. Miller, and C. G. Willson, Macromolecules 15, 915 (1982).
12. R. R. Kunz, R. D. Allen, W. D. Hinsberg, and G. M. Wallraff, Proc. SPIE 1925, 167 (1993).
13. R. D. Allen, I. Y. Wan, G. M. Wallraff, G. M. DiPietro, A. Richard, D. C. Hofer, and R. R. Kunz, ACS Symp. Ser. 614, 255 (1995).
14. U. Okoroanyanwu, T. Shimokawa, J. Byers, and C. G. Willson, Chem. Mater. 10, 3319 (1998).
15. U. Okoroanyanwu, Doctoral dissertation, The University of Texas at Austin, 1997.
16. R. D. Allen, W. E. Conley, and R. R. Kunz, Proc. SPIE 39, 321 (1997).
17. T. Chiba, R. J. Hung, S. Yamada, B. Trinque, M. Yamachika, C. Brodsky, K. Patterson, A. Vander Heyden, A. Jamieson, S. Lin, M. Somervell, J. Byers, W. Conley, and C. G. Willson, J. Photopolym. Sci. Technol. (submitted).
18. M. H. Somervell, D. S. Fryer, B. Osborn, K. Patterson, S. Cho, J. Byers, and C. G. Willson, Proc. SPIE 3999 (2000).
19. M. H. Somervell, D. S. Fryer, B. Osborn, K. Patterson, J. Byers, and C. G. Willson, J. Vac. Sci. Technol. B (submitted).