SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Applied Polymer Science

Volumn 81, Issue 4, 2001, Pages 1014-1020

Crosslinkable positive-tone photoresist comprising polymers with pendant carboxyl groups

(3) Luisier, A a Bourban, P E a Mnson, J A E a

a EPFL (Switzerland)

Author keywords

Acid catalyzed dehydration; Alicyclic groups; Bornylmethacrylate; Photoacid generator (PAG); Photoresist

Indexed keywords

ACIDS; CATALYSIS; CROSSLINKING; DEHYDRATION; LITHOGRAPHY; ORGANIC COMPOUNDS; PHOTORESISTS; RESINS; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY;

ACID CATALYZED DEHYDRATION; BINDER RESINS; CROSSLINKABLE POSITIVE PHOTORESIST; PENDANT ALICYCLIC BORNYL GROUPS;

COPOLYMERS;

EID: 0035948805 PISSN: 00218995 EISSN: None Source Type: Journal
DOI: 10.1002/app.1523 Document Type: Article

Times cited : (3)

References (19)

1
- 0032632492
- (1999) J Polym Sci, Part A, Polym Chem , vol.37
- Havard, J.M.¹ Yoshida, M.² Pasini, D.³ Vladimirov, N.⁴ Frechet, J.M.J.⁵ Medeiros, D.R.⁶ Patterson, K.⁷ Yamada, S.⁸ Wilson, C.G.⁹ Byers, J.D.¹⁰

2
- 0002049569
- (1999) Eur Polym J , vol.35 , Issue.1 , pp. 69
- Meyer, U.¹ Kern, W.² Hummel, K.³ Stelzer, F.⁴

3
- 4243204463
- (1999) High Energy Chem , vol.33
- Grishina, A.D.¹ Tedoradze, M.G.² Kolesnikov, V.A.³ Brusentseva, M.A.⁴ Vannikov, A.V.⁵

4
- 0001491625
- (1999) Chem Mater , vol.11 , Issue.8 , pp. 2126
- Kudo, K.¹ Arimitsu, K.² Ohmori, H.³ Ito, H.⁴ Ichimura, K.⁵

5
- 4243330203
- (1999) J Vacu Sci Tech B , vol.17
- Timko, A.G.¹ Houlihan, F.M.² Cirelli, R.A.³ Nalamasu, O.⁴ Yoshino, T.⁵ Itani, T.⁶ Tanabe, H.⁷ Kasama, K.⁸

6
- 0001001627
- (1999) Chem Rev , vol.99 , Issue.7 , pp. 1801
- Wallraff, G.M.¹ Hinsberg, W.D.²

7
- 85024344437
- (1993) J Photopolym Sci Tech , vol.6 , pp. 575
- Allen, D.¹ Wallraff, G.M.² Hinsberg, W.E.³ Kunz, R.R.⁴

8
- 84961347334
- (1993) J Photopolym Sci Tech , vol.6 , pp. 473
- Kunz, R.R.¹ Hartncy, M.A.² Horn, M.W.³ Keast, C.L.⁴ Rothschild, M.⁵ Shaver, D.C.⁶

9
- 0026438635
- Proc SPIE 1992 , vol.1672 , pp. 66
- Kaimoto, Y.¹ Nozaki, K.² Tahechi, S.³ Abe, N.⁴

10
- 0001892493
- (1994) J Photopolym Sci Tech , vol.7 , pp. 31
- Takahashi, M.¹ Takechi, S.² Nozaki, K.³ Kaimoto, Y.⁴ Abe, N.⁵

11
- 0000363715
- (1998) Chem Mater , vol.10 , Issue.11 , pp. 3319
- Okoroanyanwu, U.¹ Shimokawa, T.² Byers, J.³ Willson, C.G.⁴

12
- 0006887289
- (1998) Chem Mater , vol.10 , Issue.11 , pp. 3328
- Okoroanyanwu, U.¹ Byers, J.² Shimokawa, T.³ Willson, C.G.⁴

13
- 0029727391
- Proc SPIE 1996 , vol.2724 , pp. 355
- Wallo, T.I.¹ Houlihan, F.M.² Nalamasu, O.³ Chandross, E.A.⁴ Neenan, T.X.⁵ Reichmanis, E.⁶

14
- 85088086230
- Proc. SPIE 1996 , vol.2724 , pp. 344
- Schaedeli, U.¹ Tingucly, E.² Blakency, A.J.³ Falcigno, P.⁴ Kunz, R.R.⁵

15
- 0004845182
- (1996) U.S. Pat. 5,554,465
- Watanabe, H.¹

16
- 0035277697
- (2001) High Perform Polym , vol.13 , pp. 1
- Liu, J.H.¹ Shih, J.C.²

17
- 4243327743
- to appear
- J Appl Polym Sci
- Liu, J.H.¹ Shih, J.C.² Shih, C.H.³

18
- 0031122459
- (1997) Polym Int , vol.42 , pp. 385
- Liu, J.H.¹ Liu, H.T.² Tsai, F.R.³

19
- 0030211516
- (1996) J Appl Polym Sci , vol.61 , pp. 1211
- Liu, J.H.¹ Tsai, F.R.² Wang, J.H.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.