Novel crosslinking method for negative tone photoresist having pendant carboxyl moieties

High Performance Polymers

Volumn 13, Issue 1, 2001, Pages 1-10

  Liu, J H ^a   Shih, J C ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BINDERS; CROSSLINKING; DIMERS; ETCHING; HEAT TREATMENT; PHOTORESISTS; PHOTOSENSITIVITY; POLYMETHYL METHACRYLATES; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS;

POLYBUTYL METHACRYLATES; POLYMETHACRYLIC ACIDS;

COPOLYMERS;

EID: 0035277697     PISSN: 09540083     EISSN: None     Source Type: Journal    
DOI: 10.1088/0954-0083/13/1/301     Document Type: Article

References (13)