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Volumn 35, Issue 1, 1999, Pages 69-76

New positive resists with cycloaliphatic structures in the main chain

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0002049569     PISSN: 00143057     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0014-3057(98)00094-9     Document Type: Article
Times cited : (10)

References (14)
  • 9
    • 0001286503 scopus 로고    scopus 로고
    • Stelzer F. J.M.S. Pure Appl. Chem. 1996;A33:941; Mühlebach A, Schaedeli U. Advanced materials and forms: photosensitive metathesis polymers. In: Clough RL, Shalaby SW, editors. Irradiation of polymers. ACS Symposium Series 620. Washington, DC: American Chemical Society, 1994.
    • (1996) Pure Appl. Chem. , vol.A33 , pp. 941
    • Stelzer, F.J.M.S.1
  • 10
    • 17144449222 scopus 로고
    • Advanced materials and forms: Photosensitive metathesis polymers
    • Clough RL, Shalaby SW, editors. Irradiation of polymers. Washington, DC: American Chemical Society
    • Stelzer F. J.M.S. Pure Appl. Chem. 1996;A33:941; Mühlebach A, Schaedeli U. Advanced materials and forms: photosensitive metathesis polymers. In: Clough RL, Shalaby SW, editors. Irradiation of polymers. ACS Symposium Series 620. Washington, DC: American Chemical Society, 1994.
    • (1994) ACS Symposium Series 620
    • Mühlebach, A.1    Schaedeli, U.2
  • 13
    • 85034551021 scopus 로고
    • Ph.D. thesis, Technical University of Graz
    • Zenkl E. Ph.D. thesis, Technical University of Graz (1992).
    • (1992)
    • Zenkl, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.