Acid proliferation processes of 3-phenyl-3,3-ethylenedioxypropyl sulfonates in photosensitive polymer films leading to "air infection"

Chemistry of Materials

Volumn 11, Issue 8, 1999, Pages 2126-2131

  Kudo, Kazuaki ^a   Arimitsu, Koji ^a   Ohmori, Hironori ^a   Ito, Hiromitsu ^a   Ichimura, Kunihiro ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001491625     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9900554     Document Type: Article

References (12)

1. Salomone, J. C., Ed. Polymeric Materials Encyclopedia; CRC Press: Boca Raton, FL, 1996; Vol. 2, pp 1170-1187.
2. (a) Ichimura, K.; Arimitsu, K.; Kudo, K. Chem. Lett. 1995, 551.
3. (b) Arimitsu, K.; Kudo, K.; Ichimura, K. J. Am. Chem. Soc. 1998, 120, 37.
4. (a) Kudo, K.; Arimitsu, K.; Ohmori, H.; Ichimura, K. J. Photopolym. Sci. Technol. 1995, 8, 45.
5. (b) Kudo, K.; Arimitsu, K.; Ohmori, H.; Ito, H.; Ichimura, K. Chem. Mater. 1999. 11, 2119 (preceding paper in this issue).
6. Kudo, K.; Arimitsu, K.; Ichimura, K. Mol. Cryst. Liq. Cryst. 1996, 280, 307.
7. Fréchet, J. M. J.; Eichler, E.; Ito, H.; Willson, C. G. Polymer 1983, 24, 995.
8. Schlegel, L.; Ueno, T.; Hayashi, N.; Iwayanagi, T. Jpn. J. Appl. Phys. 1991, 30, 3132.
9. Ohmori, H.; Arimitsu, K.; Kudo, K.; Hayashi, Y.; Ichimura, K. J. Photopolym. Sci. Technol. 1996, 9, 25.
10. Kihara, N.; Saito, S.; Ushirogouchi, T.; Nakase, M. J. Photopolym. Sci. Technol. 1995, 8, 561.
11. Ito, H.; Breyta, G.; Hofer, D. C.; Fischer, T.; Prime, B. SPIE, 1995, 2438, 53.
12. Niinomi, T.; Tomiyasu, H.; Kameyama, Y.; Tsukamoto, M.; Tanaka, Y.; Fujita, J.; Shimomura, S.; Ochiai, T. SPIE 1996, 2724, 174.