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Journal of Physics D: Applied Physics

Volumn 34, Issue 18, 2001, Pages 2782-2791

The effects of varying plasma parameters on silicon thin film growth by ECR plasma CVD

(3) Summers, S a Reehal, H S a Shirkoohi, G H a

a LONDON SOUTH BANK UNIVERSITY (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD EFFECTS; ELECTROMAGNETS; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; MAGNETIC FIELD EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON;

DEKTAK PROFILOMETRY;

THIN FILMS;

EID: 0035929086 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/34/18/311 Document Type: Article

Times cited : (12)

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