Plasma parameter and deposited films measurements in reactive SiH4 based electron cyclotron resonance plasmas

Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1359-1364

  Ueda, Yoko ^a   Inoue, Yuichiro ^a   Morimoto, Michikazu ^a   Kawai, Yoshinobu ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Amorphous silicon film; ECR plasma; Multi slot antenna

Indexed keywords

EID: 0003099916     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00254-5     Document Type: Article

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