Measurements of ECR silane plasma parameters

Journal of Materials Processing Technology

Volumn 92-93, Issue , 1999, Pages 230-234

  Kawai, Y ^a   Ueda, Y ^a   Morimoto, M ^a   Hiejima, S ^a   Katsumata, I ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ELECTRON DENSITY MEASUREMENT; INTERFEROMETERS; NEGATIVE IONS; PLASMAS; PROBES; SILANES; SLOT ANTENNAS; TEMPERATURE MEASUREMENT;

ION SENSITIVE PROBE; ION TEMPERATURE MEASUREMENT; LANGMUIR PROBE; MICROWAVE INTERFEROMETER;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0342733558     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-0136(99)00171-5     Document Type: Article

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