Infrared study of carbon incorporation during chemical vapor deposition of SiC using methylsilanes

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 591-596

  Shinohara, Masanori ^a   Kimura, Yasuo ^a   Shoji, Daisei ^a   Niwano, Michio ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Adsorption; Infrared absorption; Methylsilane; Si surface; Thermal decomposition

Indexed keywords

ABSORPTION SPECTROSCOPY; ADSORPTION; CHEMICAL VAPOR DEPOSITION; INFRARED SPECTROSCOPY; PYROLYSIS; SILICON COMPOUNDS; THERMAL EFFECTS;

INFRARED ABSORPTION SPECTROSCOPY; METHYLSILANES;

SILICON CARBIDE;

EID: 0035873459     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00137-4     Document Type: Article

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