Infrared study of adsorption and thermal decomposition of Si2H6 on Si(100)

Thin Solid Films

Volumn 369, Issue 1, 2000, Pages 16-20

  Shinohara, Masanori ^a   Niwano, Michio ^a   Neo, Yoichiro ^a   Yokoo, Kuniyoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ADSORPTION; ANNEALING; DESORPTION; INFRARED SPECTROSCOPY; PYROLYSIS; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SILANES; SUBSTRATES;

INFRARED ABSORPTION SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 0034226333     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00826-9     Document Type: Article

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