|
Volumn 34, Issue 9, 2001, Pages 1430-1435
|
Crystalline carbonitride forms harder than the hexagonal Si-carbonitride crystallite
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CARBON NITRIDE;
CHEMICAL VAPOR DEPOSITION;
ENERGY DISPERSIVE SPECTROSCOPY;
FLOW OF FLUIDS;
NITROGEN;
PLASMA APPLICATIONS;
SEMICONDUCTING SILICON;
STOICHIOMETRY;
SUBSTRATES;
TITANIUM ALLOYS;
WAVELENGTH DISPERSIVE SPECTROSCOPY;
X RAY DIFFRACTION ANALYSIS;
GRAZING INCIDENCE X-RAY DIFFRACTION (GIXRD);
MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION (MP-CVD);
CRYSTALLINE MATERIALS;
|
EID: 0035821019
PISSN: 00223727
EISSN: None
Source Type: Journal
DOI: 10.1088/0022-3727/34/9/322 Document Type: Article |
Times cited : (11)
|
References (31)
|