Characterization of carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Surface and Coatings Technology

Volumn 127, Issue 2, 2000, Pages 260-265

  Zhang, Y P ^a   Gu, Y S ^a   Chang, X R ^a   Tian, Z Z ^a   Shi, D X ^a   Zhang, X F ^a   Yuan, L ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CARBON INORGANIC COMPOUNDS; ENERGY DISPERSIVE SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLARIZATION; RAMAN SPECTROSCOPY; STOICHIOMETRY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE FILMS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; SILICON SUBSTRATES;

THIN FILMS;

EID: 0033688325     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)