Highly c-axis oriented LiNb 0.5 Ta 0.5 O 3 thin films on Si substrates fabricated by thermal plasma spray CVD

Applied Surface Science

Volumn 182, Issue 1-2, 2001, Pages 150-158

  Kulinich, S A ^a   Shibata, J ^a   Yamamoto, H ^a   Shimada, Y ^a   Terashima, K ^a   Yoshida, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

LiNb 0.5 Ta 0.5 O 3; Thermal plasma spray; Thin films; X ray diffraction

Indexed keywords

CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; LITHIUM NIOBATE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RATE CONSTANTS; SEMICONDUCTING SILICON; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

THERMAL PLASMA SPRAYS;

THIN FILMS;

EID: 0035813558     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00523-2     Document Type: Article

References (27)