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Journal of Crystal Growth

Volumn 220, Issue 3, 2000, Pages 336-340

High-rate deposition of LiNb1-xTaxO3 films by thermal plasma spray CVD

(4) Majima, T a Yamamoto, H a Kulinich, S A a Terashima, K a

a UNIVERSITY OF TOKYO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; LITHIUM COMPOUNDS; PLASMA SPRAYING; SAPPHIRE; SUBSTRATES;

FULL-WIDTH AT HALF-MAXIMUM (FWHM); PLASMA ATOMIC EMISSION SPECTROSCOPY;

OPTICAL FILMS;

EID: 0034514167 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(00)00854-X Document Type: Article

Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.