Low biased voltage induced textured growth of LiNbO 3 films on silicon wafer

Applied Surface Science

Volumn 109-110, Issue , 1997, Pages 520-523

  Liu, Z G ^a   Hu, W S ^a   Guo, X L ^a   Liu, J M ^a   Feng, D ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DIELECTRIC FILMS; ELECTRIC FIELD EFFECTS; FERROELECTRIC MATERIALS; LITHIUM COMPOUNDS; MICROSTRUCTURE; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON WAFERS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

PULSED LASER DEPOSITION;

FILM GROWTH;

EID: 0031077943     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00628-9     Document Type: Article

References (6)

1. K. Nassau, J. Phys. Chem. Solids 27 (1966) 989.
2. P.W. Haycock and P.D. Townsend, Appl. Phys. Lett. 62 (1993) 435.
3. M. Yamada, N. Nada, M. Saitoch and K. Watanabe, Appl. Phys. Lett. 62 (1993) 435.
4. J.-M. Liu, Z.G. Liu, S.N. Zhu and Z.C. Wu, Mater. Lett. 20 (1994) 35.
5. W.S. Hu, Z.G. Liu and D. Feng, Solid State Commun. 97 (1996) 481.
6. M. Volmer and A. Weber, Z. Phys. Chem. 119 (1926) 227.