SCOPUS 정보 검색 플랫폼

Solar Energy Materials and Solar Cells

Volumn 65, Issue 1, 2001, Pages 541-547

Poly-silicon films with low impurity concentration made by hot wire chemical vapour deposition

(3) Schropp, R E I a Alkemade, P F A b Rath, J K a

a UTRECHT UNIVERSITY (Netherlands)

b DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTAL IMPURITIES; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; OXIDATION; OXYGEN; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING FILMS;

HOT WIRE CHEMICAL VAPOUR DEPOSITION; HYDROGEN DILUTION; POLYSILICON FILMS;

SILICON SOLAR CELLS;

EID: 0035198341 PISSN: 09270248 EISSN: None Source Type: Journal
DOI: 10.1016/S0927-0248(00)00138-0 Document Type: Article

Times cited : (15)

References (12)

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