MEMS-based precision motion control approach to high-throughput-rate electron beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4592, Issue , 2001, Pages 450-461

  Chase, J Geoffrey ^a   Smith, Bram W ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; INTELLIGENT MATERIALS; MICROELECTRONIC PROCESSING; MOTION CONTROL;

PRECISION MOTION CONTROL;

MICROELECTROMECHANICAL DEVICES;

EID: 0035768514     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.449002     Document Type: Conference Paper

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