157 nm single-layer and bilayer resists based on α-methylstyrene polymers

Journal of Photopolymer Science and Technology

Volumn 14, Issue 4, 2001, Pages 621-629

  Shirai, Masamitsu ^a   Shinozuka, Toyofumi ^a   Okamura, Haruyuki ^a   Tsunooka, Masahiro ^a   Kishimura, Shinji ^b   Endo, Masayuki ^b   Sasago, Masaru ^b  

^a Osaka Prefecture University   (Japan)

^b PANASONIC CORPORATION   (Japan)

Author keywords

Bilayer resist; Methacrylonitrile; VUV resist; methylstyrene

Indexed keywords

ALPHA METHYLSTYRENE; METHACRYLONITRILE; POLYMER; STYRENE DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL STRUCTURE; FOURIER TRANSFORMATION; INFRARED SPECTROSCOPY; LITHOGRAPHY; POLYMERIZATION; PROTON NUCLEAR MAGNETIC RESONANCE; SYNTHESIS; ULTRAVIOLET IRRADIATION; VACUUM ULTRAVIOLET LITHOGRAPHY;

EID: 0035746839     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.621     Document Type: Article

References (18)