On the roadmap, off the roadmap, beyond the roadmap for lithography

Journal of Photopolymer Science and Technology

Volumn 12, Issue 4, 1999, Pages 585-590

  Sasago, Masaru ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

ArF excimer laser; Electron beam direct writing; Extreme ultraviolet; Lithography; Mask; Proximity X ray; Resist; Vacuum ultraviolet

Indexed keywords

EID: 0000762504     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.585     Document Type: Article

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