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Volumn 30, Issue 4, 2001, Pages 201-204

The effect of interface quality on Si/SiO2 resonant tunnel diodes

Author keywords

Interface roughness; Oxide; Resonant tunnel diode; Silicon

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; INTERFACES (MATERIALS); MONOLAYERS; RESONANT TUNNELING; SEMICONDUCTING SILICON; SILICA; SURFACE ROUGHNESS;

EID: 0035714095     PISSN: 07496036     EISSN: None     Source Type: Journal    
DOI: 10.1006/spmi.2001.1008     Document Type: Article
Times cited : (4)

References (14)
  • 8
    • 85031476386 scopus 로고    scopus 로고
    • Final Report for Silicon-Based Quantum MOS Technology Development Contract No. F49620-96-C-006 prepared by Raytheon Systems Co. for AFOSR


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.