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Volumn 48, Issue 6, 2001, Pages 1282-1284
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Fabrication of monolithically-integrated InAlAs/InGaAs/InP HEMTs and InAs/AlSb/GaSb resonant interband tunneling diodes
a a a a b b b c |
Author keywords
Aluminum antimonide; Gallium antimonide; High electron mobility transistor (HEMT); Indium arsenide; Indium phosphide; Monolithic integration; Resonant tunneling; Resonant tunneling diode (RTD)
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Indexed keywords
CARRIER MOBILITY;
CURRENT DENSITY;
ELECTRIC POTENTIAL;
MOLECULAR BEAM EPITAXY;
MONOLITHIC INTEGRATED CIRCUITS;
RESONANT TUNNELING;
SEMICONDUCTING INDIUM COMPOUNDS;
SUBSTRATES;
RESONANT INTERBAND TUNNELING DIODES (RITD);
HIGH ELECTRON MOBILITY TRANSISTORS;
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EID: 0035366332
PISSN: 00189383
EISSN: None
Source Type: Journal
DOI: 10.1109/16.925263 Document Type: Article |
Times cited : (14)
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References (8)
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