SCOPUS 정보 검색 플랫폼

Volumn 11, Issue 11, 2001, Pages

XPS investigation of UV-annealed ultrathin Ta2O5 films on silicon

(10) Fang, Q a Zhang, J Y a Wang, Z M a Wu, J X a O'Sullivan, B J a Hurley, P K a Leedham, T L a Audier, M A a Senateur J P a Boyd, I W a

a UNIVERSITY COLLEGE LONDON (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; LOW TEMPERATURE OPERATIONS; PHOTOCHEMICAL REACTIONS; PHOTONS; SEMICONDUCTING SILICON; SILICA; STOICHIOMETRY; TANTALUM COMPOUNDS; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTODEPOSITED FILM PROPERTY; PHOTON FLUX; ULTRATHIN TANTALUM PENTOXIDE FILM;

ULTRATHIN FILMS;

EID: 0035710215 PISSN: 11554339 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (1)

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