Trace rare gases optical emission spectroscopy for determination of electron temperatures and species concentrations in chlorine-containing plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 4 SUPPL. B, 1998, Pages 2388-2393

  Donnelly, Vincent M ^a   Malyshev, Mikhail V ^a,b   Kornblit, Avi ^a   Ciampa, Nicolas A ^a   Colonell, Jennifer I ^a   Lee, John T C ^a  

^a LUCENT TECHNOLOGIES   (United States)

^b PRINCETON PLASMA PHYSICS LABORATORY   (United States)

Author keywords

Chlorine plasma; Electron temperature; Etching; Optical diagnostics; Plasma diagnostics

Indexed keywords

CHLORINE; DISSOCIATION; EMISSION SPECTROSCOPY; GAS EMISSIONS; INERT GASES; PLASMA DIAGNOSTICS; PROBES; TEMPERATURE MEASUREMENT;

ELECTRON TEMPERATURES; HIGH DENSITY INDUCTIVELY COUPLE PLASMAS; LANGMUIR PROBES;

ELECTRONS;

EID: 0032046839     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2388     Document Type: Article

References (27)

1. J. W. Coburn and M. Chen: J. Appl. Phys. 51 (1980) 3134.
2. M. V. Malyshev and V. M. Donnelly: J. Vac. Sci. Technol. A 15 (1997) 550.
3. V. M. Donnelly: J. Vac. Sci. Technol. A 14 (1996) 1076.
4. M. V. Malyshev, V. M. Donnelly, A. Kornblit and N. A. Ciampa: submitted to J. Appl. Phys.
5. M. V. Malyshev, V. M. Donnelly, A. Kornblit, N. A. Ciampa, J. I. Colonell and J. T. C. Lee: submitted to J. Vac. Sci. Technol.
6. 2.
7. P. V. Feltsan and I. P. Zapesochnyi: Ukr. Fiz. Zh. 12 (1967) 633.
8. P. V. Feltsan and I. P. Zapesochnyi: Ukr. Fiz. Zh. 12 (1967) 1423.
9. P. V. Feltsan and I. P. Zapesochnyi: Ukr. Fiz. Zh. 13 (1968) 205.
10. J. E. Chilton, J. B. Boffard, R. S. Schappe and C. C. Lin: private communication, to be published in J. Phys. B.
11. J. T. Fons, J. E. Chilton, P. Rugheimer and C. C. Lin: 50th Gaseous Electronics Conf., Madison Wisconsin, Oct. 6-9, 1997, paper PR1 5.
12. J. B. Boffard, G. A. Piech, M. F. Gehrke, M. E. Lagus, L. W. Anderson and C. C. Lin: J. Phys. B 29 (1996) L795.
13. A. A. Mityureva, N. P. Penkin and V. V. Smirnov: Opt. Spectrosc. 66 (1989) 463.
14. A. A. Mityureva, N. P. Penkin and V. V. Smirnov: Opt. Spectrosc. 67 (1989) 461.
15. A. A. Mityureva and V. V. Smirnov: Opt. Spectrosc. 74 (1993) 6.
16. A. A. Mityureva, N. P. Penkin and V. V. Smirnov: Opt. Spectrosc. 60 (1986) 144.
17. C. Winstead and V. McCoy: private communication.
18. J. I. Colonell, M. V. Malyshev, N. A. Ciampa, V. M. Donnelly and A. Kornblit: 44th AVS Symp., San Jose, October 20-24, 1997.
19. J. I. Colonell, S. W. Downey, T. Kook, R. Patrick, S. Siu and P. L. Jones: Proc. 2nd Intl. Symp. Plasma Process-Induced Damage (1997) p. 229.
20. K. Hashimoto: Jpn. J. Appl. Phys. 33 (1994) 6013.
21. V. Vahedi, N. Benjamin and A. Perry, Proc. 2nd Intl. Symp. Plasma Process-Induced Damage (1997) p. 41.
22. Principles of Plasma Discharges and Materials Processing, eds. M. A. Lieberman and A. J. Lichtenberg (John Wiley and Sons, Inc., New York, 1994) p. 306.
23. Rate constants computed from a Maxwellian EEDF and cross section measurements of F. Stevie and M. J. Vasile: J. Chem. Phys. 74 (1981) 5106.
24. Rate constants computed from a Maxwellian EEDF and cross section measurements of T. R. Hayes, R. C. Wetzel and R. S. Freund: Phys. Rev. A 35 (1987) 578.
25. V. A. Godyak: Soviet Radio Frequency Discharge Research (Delphic Associates, Falls Church, VA, 1986).
26. G. P. Kota, J. W. Coburn and D. B. Graves: to be published in J. Vac. Sci. Technol. (1997).
27. Volume is defined as the volume occupied by the plasma, not the total reactor volume. In the TCP reactors, this volume is defined by the TCP window and chuck, and by the boundary where the plasma density falls by one-half. In the helical resonator, it is the discharge tube volume plus an added downstream volume estimated from optical emission.